InnoStamp 40 - Automated MicroContact Printing, Uniform Micro and NanoPatterning

Full automation of nanopatterning processes

Combining microcontact printing flexibility and high-precision automation, the InnoStamp 40 is the perfect tool for nano and micropatterning. A user-friendly system, the InnoStamp 40 allows users to control their processing in order to transfer a wide range of components homogeneously onto defined surfaces.The InnoStamp 40, based on the InnoStamp technology, allows for full automation of nanopatterning processes.

General Description

As a new fully automated microcontact printing solution, the InnoStamp 40 offers high-precision and uniform contact for sub-micron resolution.

  • High process reproducibility thanks to the force homogeneity.
  • Nanometric resolution: the range of pressure allows printing at the nanoscale.
  • Easy Scaling up and easy valorization of your R&D activity. InnoStamp 40 is a generic system that allows users to manipulate small substrates (1cm²) for R&D purposes as well as large substrates (100cm²) for small to medium industrial series.
  • No loss of know-how. InnoStamp 40 is a non user-dependent system notably preventing the loss of process knowledge acquired over time.
    A fast and reliable support. The experience of our support team combined to our partnership with academic experts in microcontact printing (Christophe VIEU from LAAS-CNRS, BIOSOFT) allow users to quickly implement their nanopatterning process.

Our technology, InnoStamp, is based on magnetic-field assisted microcontact printing. A magnetic layer of PDMS is added to the standard stamp in order to be sensitive to the magnetic field.

With a set of magnets, it is possible to apply a force onto the stamp in order to:

  • Manipulate it and move it from one step to the other during the microcontact printing process.
  • Monitor the pressure during the printing step (step 6).
  • The advantages of this technology are:
    • Accurate force monitoring: crucial for Nanopatterning
    • Manipulation of the stamp by magnetic force: micro positioning, high reproducibility & stamp design versatility
    • Homogeneous pressure
    • Printing on small as well as large surface
    • Patterning on non-planar surface, thanks to the use of magnetic force and the flexibility of the stamp

Related documents

Technical specifications

Spécifications Data
Configuration of drawer
A user-selected support configuration:

– Support for 4 microscope slides

– Support for wafer chips with 1 circular stamp ((maximum diameter of 96mm)

Loading Step

Compatible Stamps From 1×1 cm² to 4 inch wafer

Depends on user-selectd support configuration


Inking Step

Support Compatible with micro plates of 96, 384, and 1536 wells and other
Duration Adjustable from 1 to 3600s ; steps of 1s
Temperature Adjustable from 0°C to 51°C with a maximum exterior temperature of 20°C

Precision of temperature sensor: +/-0.1°C ; stability +/-0.5°C for 8h

Limited Evaporation Option to set temperature to dew point

Classic substrate-stamp alignment step

X-Y axis alignment (+/-5 µm)

Drying Step

Sources Options : ambient air ; Nitrogen gas ; external source
Duration Controlled via user interface: adjustable from 1 to 3600s ; steps of 1s

Printing Step

Parameters Format, number of substrates and stamping coordinates defined via user interface
Compatible Inks Nano-objects, chemical substances, biomolecules (proteins, DNA, and others)


Compatible Supports  Glass, platic, silicon wafer, and others

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Maximum surface size 4″ x 4″
Amplitude of contact force From 0 to 150 kPa depending on the selected magnetic module.

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Duration Adjustable from 1 to 3600s ; steps of 1s
Precision X: +/- 3µm, Y: +/- 3µm, angular: +/- 0.5°
Homogeneity +/- 20µm
Size of pattern Depends on design of stamps and the nature of the molecules being deposited.

Classic micro-contact printing: from 140nm

Molding: from 230nm


Optional Module: Dynamometer

Range of Operation  Up to 20N

Optional Module: Molding

Support Heating  Range: ambient temperature to 120°C

Precision: +/- 0.5°C ; Resolution: 1°C

Pipetting tool From 30µL to 1mL (steps of 30µL and precision of +/- 2µL)

Cleaning step

Solutions  Solution flow of acido-basic buffer or ethanol solvent

* Non exhaustive list, please contact us for more information about fluorophore compatibility
Please contact us for any additional information.

Class I laser product for research use only
Specifications subject to change without notice
Contact us for the most recent specifications