InnoStamp 40 - Automated MicroContact Printing, Uniform Micro and NanoPatterning
Full automation of nanopatterning processes
General Description
As a new fully automated microcontact printing solution, the InnoStamp 40 offers high-precision and uniform contact for sub-micron resolution.
- High process reproducibility thanks to the force homogeneity.
- Nanometric resolution: the range of pressure allows printing at the nanoscale.
- Easy Scaling up and easy valorization of your R&D activity. InnoStamp 40 is a generic system that allows users to manipulate small substrates (1cm²) for R&D purposes as well as large substrates (100cm²) for small to medium industrial series.
- No loss of know-how. InnoStamp 40 is a non user-dependent system notably preventing the loss of process knowledge acquired over time.
A fast and reliable support. The experience of our support team combined to our partnership with academic experts in microcontact printing (Christophe VIEU from LAAS-CNRS, BIOSOFT) allow users to quickly implement their nanopatterning process.

Our technology, InnoStamp, is based on magnetic-field assisted microcontact printing. A magnetic layer of PDMS is added to the standard stamp in order to be sensitive to the magnetic field.
With a set of magnets, it is possible to apply a force onto the stamp in order to:
- Manipulate it and move it from one step to the other during the microcontact printing process.
- Monitor the pressure during the printing step (step 6).
- The advantages of this technology are:
- Accurate force monitoring: crucial for Nanopatterning
- Manipulation of the stamp by magnetic force: micro positioning, high reproducibility & stamp design versatility
- Homogeneous pressure
- Printing on small as well as large surface
- Patterning on non-planar surface, thanks to the use of magnetic force and the flexibility of the stamp
Related documents
Technical specifications
Spécifications | Data |
Configuration of drawer
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A user-selected support configuration:
– Support for 4 microscope slides – Support for wafer chips with 1 circular stamp ((maximum diameter of 96mm)
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Loading Step |
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Compatible Stamps | From 1×1 cm² to 4 inch wafer
Depends on user-selectd support configuration |
Inking Step |
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Support | Compatible with micro plates of 96, 384, and 1536 wells and other |
Duration | Adjustable from 1 to 3600s ; steps of 1s |
Temperature | Adjustable from 0°C to 51°C with a maximum exterior temperature of 20°C
Precision of temperature sensor: +/-0.1°C ; stability +/-0.5°C for 8h |
Limited Evaporation | Option to set temperature to dew point |
Classic substrate-stamp alignment step |
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X-Y axis alignment | (+/-5 µm) |
Drying Step |
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Sources | Options : ambient air ; Nitrogen gas ; external source |
Duration | Controlled via user interface: adjustable from 1 to 3600s ; steps of 1s |
Printing Step |
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Parameters | Format, number of substrates and stamping coordinates defined via user interface |
Compatible Inks | Nano-objects, chemical substances, biomolecules (proteins, DNA, and others)
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Compatible Supports | Glass, platic, silicon wafer, and others
Contact us for more information |
Maximum surface size | 4″ x 4″ |
Amplitude of contact force | From 0 to 150 kPa depending on the selected magnetic module.
Contact us for more information |
Duration | Adjustable from 1 to 3600s ; steps of 1s |
Precision | X: +/- 3µm, Y: +/- 3µm, angular: +/- 0.5° |
Homogeneity | +/- 20µm |
Size of pattern | Depends on design of stamps and the nature of the molecules being deposited.
Classic micro-contact printing: from 140nm Molding: from 230nm |
Optional Module: Dynamometer |
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Range of Operation | Up to 20N |
Optional Module: Molding |
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Support Heating | Range: ambient temperature to 120°C
Precision: +/- 0.5°C ; Resolution: 1°C |
Pipetting tool | From 30µL to 1mL (steps of 30µL and precision of +/- 2µL) |
Cleaning step |
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Solutions | Solution flow of acido-basic buffer or ethanol solvent |
* Non exhaustive list, please contact us for more information about fluorophore compatibility
Please contact us for any additional information.
Class I laser product for research use only
Specifications subject to change without notice
Contact us for the most recent specifications